[guiraldelli]

"Most of [IP of ASML] comes from US" is an extremely generous sentence.

It is true those companies you referred to were bought and their IP has helped ASML in _EUV_, but they had 20 years of European IP before that, all related other parts of the lithography machine (and not EUV) that made ASML the company it is.

If you think that complexity is only in (light) source for EUV (is it already profitable for ASML, by the way?), then you have no idea the complexity of that machine!

Disclaimer: I worked in their metrology department.

[joe_mamba]

> but they had 20 years of European IP before that, all related other parts of the lithography machine (and not EUV) that made ASML the company it is.

Was any of that 20 year old European DUV lithography machine IP superior to the IP from the other DUV champions, Canon and Nikon?