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by ag8
57 days ago
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I find this paragraph to be odd: "Wavelengths as low as 13.5 nanometers can achieve more precise patterns in a single exposure. In fact, extreme ultraviolet lithography can combine three or four photolithography patterning cycles into a single one on a seven-nanometer node. Without EUV, producing five-nanometer nodes might require as many as one hundred different steps." But a five-nanometer node has a gate pitch of 45nm and a metal pitch of 20nm! Using different forms of the word "nanometer" in the same paragraph is very confusing... |
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