|
|
|
|
|
by chasil
227 days ago
|
|
Japan has also made some strides in this area, reported here a few months ago. "Professor Shintake aligned two axis-symmetric mirrors in a straight line and used a total of only four mirrors instead of ten. "Because highly absorbent EUV light weakens by 40% with each reflection, only about 1% of the energy from the light source reaches the wafer when bounced off ten mirrors while more than 10% does when only four mirrors are used." https://asiatimes.com/2024/08/japan-on-edge-of-euv-lithograp... Edit: "Substrate said that it has developed a version of lithography that uses X-ray light." |
|
https://ieeexplore.ieee.org/document/5389640