|
|
|
|
|
|
by tromp
230 days ago
|
|
|
ASML must have done extensive research on X-ray based lithography, before deciding that EUV is the better option to pursue, despite the huge technological hurdles the latter entails. Why would the trade-offs look different for Substrate? Have they overcome some huge hurdle for X-ray that ASML deemed infeasible? |
|
|