[tullatulla]

Well, you would need a template with 8x smaller features than a EUV mask (at least in one direction, 4x in the other). Ebeam lithography can in principle do this, but it's at the resolution limit and the shot noise will mean there will be a lot of defects.

A sufficiently defect free EUV mask can be worth >>1E6$, for a nano imprint template this would be much much more and it's lifetime probably a fraction. That's why nanoimprint litho is no alternative to EUV.