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by fsh 988 days ago
Lithography requires the highest possible average intensity, while the pulse length is irrelevant. The laser-driven tin plasma sources used in EUV lithography produce around 7 orders of magnitude more power than the most powerful sources based on high harmonic generation.
1 comments
amelius 988 days ago
> while the pulse length is irrelevant

I was thinking along the lines of: 1 attosecond corresponds to .3nm, so very short wavelength, so very deep UV.

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EricLeer 988 days ago
The wave length and pulse length aren't the same thing though. The short pulsed lasers actually consists of light that have many different wave lengths in them!
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amelius 988 days ago
Yes, but shouldn't there be a peak in the spectrum near the frequency corresponding to the pulselength?
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