[amluto]

I wonder if e-beam lithography would make registration easier. With photolithography, I assume one must position the wafer relative to the mask extremely precisely. With e-beam lithography, the tool is a scanning electron microscope, and as long as the wafer doesn’t move, the software could potentially locate it to essentially arbitrarily high precision and then offset and rotate the scanning pattern accordingly.

ASML surely charges plenty for their alignment hardware:

https://www.asml.com/en/news/stories/2021/fellow-simon-mathi...