|
|
|
|
|
by Kliment
1594 days ago
|
|
Because (very very roughly) the way you make small features is by scaling down your projection area to a tiny size and then stepping it across the wafer. Your projection area boundaries are where errors are most likely, and the bigger your features the more such boundaries they cross. The details are quite involved, but this is the general problem. |
|
Also, you could use the design files from before any compensation you apply (to compensate for lithography errors), and use those files to derive a new compensation.