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E beam lithography in credibly difficult. Recommend chapter 13 in "Principles of Lithography" https://spie.org/Publications/Book/2525392?SSO=1.

My opinions is that this whole comment discussion about creating a competitor is in the wrong direction. It is impossible to recreate and outperform what ASML has.

A better focus would be to tackle problems in the <2nm processes. If someone found a method to stop electron tunneling at smaller nodes, this will net much more revenue and create more value for society.