| A few highlights from a conversation with a friend who works for Zeiss and regularly deals with ASML (take this with a grain of salt, I may have misunderstood some of it and he also may not be an expert in all of these areas): - The lenses (actually mirrors for EUV) only demagnify by a factor of 4. So your wafer template is already extremely small and costs millions to produce. - 13.5nm is pretty much the smallest wavelength you can reasonably handle. If you want to go smaller, you have to build a particle accelerator. (He heard that from a colleague, wasn't sure how much of that was actually true.) - The prices in this Twitter thread are pretty spot on. The EU wants to invest into chip making to become more independent in this area. But the sums they're talking about wouldn't even pay for one such machine. Politicians don't seem to be aware of the dimensions we're talking about here. - Also in the thread, ASML has a monopoly on this tech. Others have not invested into EUV and by now, it's pretty much impossible for anybody to catch up. - Everyone's hiring like crazy atm. He started home office during Covid and now Zeiss says he can't even go back to the office because they don't have enough office space anymore. He doesn't mind. Everyone's distributed all over the place anyway so whether he does conference calls at the office or at home makes no difference. - He said they're not very affected by the chip shortage. |
A lot of this tech is the result of more than 30 years of research, starting with national labs (DOE funded Sandia, LLNL, etc), then consortiums of Intel, AMD, etc (EUV LLC), in fact, ASML was a member of EUV LLV and specifically, because some of the techniques they're using was originally pioneered by DOE Labs and EUV LLC members, they had to get approval from DOE/EUV AFAIK.
Also, the core laser tech, tin droplets, was actually pioneered by Cymer, but they bought Cymer wholesale. So part of the issue is they vertically integrated a lot of the very difficult components of their machine by buying smaller companies.
This would be like TSMC buying ASML and preventing other fabs from getting access. It's definitely bad for the market, and EUV is so damn expensive it took 30 years of R&D and a consortium of companies to even get to this point. The competing technologies, using different Lasers, would need enormous funding to get them to work.
EUV LLC built a 100-nm EUV prototype almost 20 years ago using a different technique, but gave up on that path. There's also electron beam lithography (EBL) which is maskless AFAIK, but I don't think it ever made it to production either. I guess Intel and other players decided it was better to just own ASML stock.
So the world seems stuck with ASML, unless of course, China gets a hold of one of the machines and decides to just clone it and ignore patents.