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by patwillson22
2170 days ago
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My advice to anyone who's looking for a pathway into open source silicon is to look into E-Beam lithography. Effectively E-Beam lithography involves using a scanning electron microscope to expose a resist on silicon. This process is normally considered to slow for industrial production but it's simplicity and size make it ideal for prototyping and photo mask production. The simplistic explanation for why this works is that electron beams can be easily focused using magnetic lenses into a beam that reaches the nano meter level. These beams can then be deflected and controlled electronically which is what makes it possible to effectively make a cpu from a cad file. Furthermore, It's very easy to see how the complexity of photolithography goes up exponentially as we scale down. Therefore I believe it makes sense to abandon the concept of photolithography entirely if we want open souce silicon. I believe that this approach offers something similar to the sort of economics that enable 3D printers to become localized centers of automated manufacturing. I should also mention that commercial E-beam machines are pretty expensive (something like 1-Mil) but that I dont think it would be that difficult to engineer one for a mere fraction of that price. |
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Theoretically it should be feasible to fab 350 nm without double-patterning by optimizing a simple immersion DLP/DMD i-line stepper.
I think ArF immersion with double-patterning should be able to do maskless 90 nm.