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by ragebol 2553 days ago
AFAIK, some (less than?) 2% of energy put into the EUV source ends up at the wafer. The EUV-source has been the biggest struggle for ASML from what I gathered in media.

Apparently, tiny droplets of tin are created by spinning some disk(s) and then those droplets are zapped with with a laser before they emit EUV. Those machines are crazy complex.

1 comments

UV is under 1%, and EUV is under .01%