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by no_flags
3078 days ago
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First question, no, they use CO2 lasers which emit in the um range, not nm. Probably a typo. Second question, the loss of power is due to two factors:
1) Conversion efficiency of CO2 laser pulse to EUV light pulse. This is in the single digit range as a percentage.
2) Transmission loss of EUV from light source to wafer. EUV mirrors reflect in the ballpark of 50% of the light, and there are many of them inside the scanner, so you have .5 * .5 * .5... |
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